MBE and EBL process systems

MBE (Molecular Beam Epitaxy) is a deposition technique used for growing thin layers of crystalline materials on a substrate by molecular beams under ultra-high vacuum conditions. EBL (Electron Beam Lithography) is a lithography method that uses a focused electron beam to draw extremely detailed patterns on a surface, typically for manufacturing nanoscale devices. Both processes are critical to the fabrication of advanced semiconductor devices.